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New method of engineering polymer brush patterns promises to cut down processing time while adding versatility in design - Phys.Org
Phys.Org | New method of engineering polymer brush patterns promises to cut down processing time while adding versatility in design Phys.Org In a paper describing a method called "sequential stop-flow photopatterning," UCSB materials scientists describe a new platform for functionalizing and engineering surfaces with patterned polymer brushes. "It's a really powerful tool you can use for ... |
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17.09.2016 (3166日前)
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